BÜCHER VERSANDKOSTENFREI INNERHALB DEUTSCHLANDS
Ion Implantation and Annealing Applications, Science and Technology
Contributions from IIT School, Edition 2024
Springer
ISBN 978-3-032-10007-8
Standardpreis
Bibliografische Daten
Fachbuch
Buch. Hardcover
2026
410 s/w-Abbildungen, 14 Farbabbildungen.
In englischer Sprache
Umfang: vi, 8 S.
Format (B x L): 15,5 x 23,5 cm
Verlag: Springer
ISBN: 978-3-032-10007-8
Weiterführende bibliografische Daten
Das Werk ist Teil der Reihe: Topics in Applied Physics
Produktbeschreibung
This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.
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