Hibberd / Kenderdine

Deep Fakes

A Critical Lexicon for Digital Museology

Taylor & Francis Ltd

ISBN 978-1-03-236914-3

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ca. 179,50 €

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Bibliografische Daten

Buch. Hardcover

2025

99 s/w-Abbildungen, 99 s/w-Fotos.

In englischer Sprache

Umfang: 328 S.

Format (B x L): 15.6 x 23.4 cm

Gewicht: 453

Verlag: Taylor & Francis Ltd

ISBN: 978-1-03-236914-3

Produktbeschreibung

Deep Fakes: A Critical Lexicon for Digital Museology is an illustrated monograph articulated through a comprehensive lexicon of key concepts in next generation museology. Each of the book’s ten chapters explores specific terms in the lexicon, further interpreted through installations from the 2021 exhibition Deep Fakes: Art and Its Double in Switzerland.

Deep Fakes: A Critical Lexicon for Digital Museology contends with the intensification of questions compounded by rapid technological change affecting contemporary museological and curatorial authority. This book introduces a novel theorization of computational techniques and their transformation of museological objects in the form of cultural deep fakes—the consummate shape-shifting doppelgängers of the post-digital age. This co-authored monograph elaborates on a spectrum of established theoretical concepts, including affect, aura, authenticity, embodied knowledge, mimesis, the post-original, presence, replication, reenactment and the simulacrum. Grounded in the methods and techniques of computational museology and participatory visitor experience, it critically examines the practical, epistemological, societal, and ethical implications of emerging technologies and their cultural heritage material. Harnessing the affordances of these transformative approaches for communities and societies, this critical lexicon empowers future-focused curatorship for memory organizations.

This book supports museum professionals to navigate the ramifications of dynamic technological change. Readers include directors, curators, researchers, and designers. Archival and imaging scientists, data managers, and software engineers are also broadly implicated. It has added significance for research disciplines in the history and theory of art and media studies, critical and cultural theory, digital humanities, and museum studies, alongside artists and producers in the cultural domain.

Autorinnen und Autoren

Produktsicherheit

Hersteller

Libri GmbH

Europaallee 1
36244 Bad Hersfeld, DE

gpsr@libri.de

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