Erschienen: 14.01.2014 Abbildung von Mertens / Meuris / Heyns | Ultra Clean Processing of Semiconductor Surfaces XII | 2014 | Volume 219

Mertens / Meuris / Heyns

Ultra Clean Processing of Semiconductor Surfaces XII

lieferbar, ca. 10 Tage

214,00 €

inkl. Mwst.

2014. Buch. Softcover

Trans Tech Publications. ISBN 978-3-03835-242-6

Format (B x L): 17 x 24 cm

Gewicht: 800 g

In englischer Sprache

Das Werk ist Teil der Reihe: Solid State Phenomena; Volume 219

Produktbeschreibung

Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium.
The 71 papers are grouped as follows:
Chapter 1: Cleaning for FEOL Applications,
Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area,
Chapter 3: Wet Etching for FEOL Applications,
Chapter 4: Wet Processing of High Aspect Ratio Structures,
Chapter 5: Fluid Dynamics, Cleaning Mechanics,
Chapter 6: Photo Resist Performance and Rework,
Chapter 7: Cleaning for BEOL Interconnect Applications,
Chapter 8: Cleaning for 3D Applications,
Chapter 9: Contamination Control and AMC,
Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells

Autoren

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