Erschienen: 24.01.2013 Abbildung von Mertens / Meuris / Heyns | Ultra Clean Processing of Semiconductor Surfaces XI | 2013 | Volume 195

Mertens / Meuris / Heyns

Ultra Clean Processing of Semiconductor Surfaces XI

lieferbar, ca. 10 Tage

214,00 €

inkl. Mwst.

2013. Online-Produkt , Digital. 350 S

Trans Tech Publications. ISBN 978-3-03795-333-4

Format (B x L): 12,5 x 14,2 cm

Gewicht: 200 g

In englischer Sprache

Das Werk ist Teil der Reihe: Solid State Phenomena; Volume 195


Volume is indexed by Thomson Reuters CPCI-S (WoS).
This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing).


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